Imaging Spectroscopic Ellipsometry combines the benefits of ellipsometry and optical microscopy in a single, imaging-based metrology approach. By capturing many measurement points simultaneously within the camera field of view, imaging ellipsometry transforms conventional point-based measurements into spatially resolved analysis of thin films and surfaces. As an all-optical, non-contact and non-destructive technique, Imaging Spectroscopic Ellipsometry enables the characterization of micro-structured thin-film samples with microscopic lateral resolution down to 1 µm. Depending on system configuration, it provides fully spectroscopic, quantitative mapping of thickness and optical properties, revealing features and sample variations that remain inaccessible to conventional single-spot ellipsometers.
Ellipsometry
Accurion EP4 is a high-end system for Imaging Spectroscopic Ellipsometry, combining spectroscopic ellipsometry and optical microscopy in a single instrument. It enables spatially resolved, parallel measurement of film thickness and refractive index on micro-structured samples with lateral resolution down to 1 µm, featuring live ellipsometric contrast imaging and direct selection of regions of interest for quantitative analysis.
Microscopic lateral resolution down to 1 µm, enabling precise determination of film thickness and refractive index on micro-structured samples.
Sub-nanometer vertical sensitivity for highly sensitive detection of ultra-thin layers, including mono- and sub-monolayers.
Imaging Spectroscopic Ellipsometry (across UV–VIS–NIR), with a configurable spectral range from 190 nm to 1700 nm.
True parallel multi-pixel measurement, performing spectroscopic ellipsometry simultaneously on every pixel within the field of view.
ROI-based measurement workflow (“First identify, then measure”), allowing intuitive selection of measurement regions directly in the live ellipsometric view.
Live ellipsometric contrast imaging for real-time visualization of thickness and optical inhomogeneities.
Automated sample stage control with large-area stitching, enabling measurements over extended sample areas.
Knife-edge illumination for non-destructive suppression of backside reflections on transparent substrates.
Modular optical design with interchangeable objective lenses, allowing adaptation to different measurement tasks.
User-friendly EP4 software suite (EP4Control, DataStudio, EP4Model) for instrument control, data analysis, and optical modeling.
Active vibration isolation ensuring superior mechanical stability for high-precision measurements.
SIMON is specifically designed for routine measurement tasks. Its simple user interface and robustness of a fixed angle ellipsometer enables the entry to imaging ellipsometry. It can be operated in two different modes. The microscopic mode is very fast and allows visualisations of variations and defects in the thinnest layers (e.g., monolayers: d = 0.35 nm), whereas the ellipsometric mode measures thickness and the refractive index of the sample materials. Imaging Ellipsometry itself combines the sensitivity of thickness and refractive index measurements with the imaging capabilities of microscopy. This allows for determining thickness and refractive index variations with microscopic images of e.g., micro-structured samples. Typical applications include the surface inspection of homogeneities and defects in large samples in quality control or the fast localization of flakes of 2D materials.
Easy-to-use entry-level Imaging Ellipsometer
Imaging Ellipsometry with a lateral ellipsometric resolution down to 1 µm
Thickness and refractive index measurements of microstructures
Fast visualization of layer thickness distribution and hidden defects on large areas